1. This interdigital electrode is widely used in chemical, physical and medical sensors, with reliable performance and stable quality!
2. Electrode substrate is monocrystalline silicon with 300nm thickness of SiO2 on the surface of the silicon wafer.
3. The suitable temperature for using is from - 100 degrees Celsius to +400 degrees Celsius.
4. overall size: 4mm*7mm.
5. Electrode resistance is more than 100T ohm (room temperature, humidity 64%)
Size:Big
1. overall size: 4mm*7mm. 2. Line Width: 30um, line space: 20um. 3. Electrode substrate is monocrystalline silicon with 300nm thickness of SiO2 on the surface of the silicon wafer. 4. Conductor layer structure: Cr/Au, the thickness are10nm and 100nm respectively. 5. The suitable temperature for using is from - 100 degrees Celsius to +400 degrees Celsius. 6. Electrode resistance is more than 100T ohm (room temperature, humidity 64%).
Häufige Fragen
TrustPilot
TrustScore 4.5 | 7.300+ Bewertungen
Al-Kaida H.
Insgesamt eine fantastische Erfahrung. Werde es Freunden und Familie empfehlen.
vor 1 Monat
Anita G.
Gute Erfahrung, aber die Tracking-Updates könnten besser sein.
